The TD-S series of SCV submersible valves®, incorporating our unique technology, can be used in high-temperature environments compatible with integrated gas systems. They are suitable for supplying precursors in atomic layer deposition (ALD) processes where consistent flow rate reproducibility is required.
Features
Compatible with high-temperature environments
Efficient heating is possible because the entire valve can be used in high-temperature environments up to 200˚C.
Stable Cv value
Cv values are 100% factory-adjusted. With little variation in the Cv value during use, stable gas flow rates can be obtained.
Initial Cv value error within ±5%; variation during use within ±10%
Adoption of PFA seat
PFA with excellent heat resistance and corrosion resistance is adopted as a seat material. It can be used for a wide variety of gases.
High durability
Performance value of 20 million cycles*
Compared with the metal seat type, adoption of the PFA seat improves durability performance, including excellent seat leak rates and extended life cycles in high-temperature environments.
Our KD-S SCV Submersible Valves® series, using our unique technology, provides flow rate reproducibility in high-temperature environments; making them suitable for supplying precursors in atomic layer deposition (ALD) processes.
Features
Compatible with high-temperature environments
The entire valve can be submerged in high-temperature environments up to 200 °C, allowing for efficient heating.
Flow rate reproducibility
Valve Cv values are factory-set. Flow rates stay stable during use and consistent with replacements.
Initial Cv value error within ±5%; variation during use within ±10%
PFA seat
PFA seat provides excellent heat and corrosion resistance, and is compatible with a wide variety of gases.
High durability
Cycle life of 5 million.*
PFA seat improves valve performance in comparison with a metal seat.
The TDF series are high-purity gas-compatible diaphragm valves that combine high-speed opening/closing operation, high durability, heat resistance, and Cv stability required for atomic layer deposition (ALD) and atomic layer etch (ALE) processes.
Features
High-speed opening/closing, and high response stability
Realizes valve total response time 18ms* and response stability ±2ms* after durability cycles.
* Performance values according to our testing methods
Compatible with high-temperature fluids
Adoption of a structure that reduces heat transfer to the actuator enables usage with high-temperature fluids up to 220°C*.
* Body Temperature up to 200°C with solenoid valve and sensor installed.
Stable Cv value
Adoption of a structure and seat material in consideration of thermal influence ensures Cv 0.5* at 220°C.
Cv values are 100% factory-adjusted. With little variation in Cv value during use, stable gas flow rates can be obtained.
* Initial Cv value error and variation during use within ±5%
High cycle life
With a 220°C high-temperature body temperature rating, and durability test performance value of one hundred million cycles or more* achieved as a result our unique technology.
*Our test performance (test conditions): fluid N2, charged pressure 0.25MPa(G), wetted area temperature 220°C
TD-S Series
SCV Submersible Valves®
The TD-S series of SCV submersible valves®, incorporating our unique technology, can be used in high-temperature environments compatible with integrated gas systems. They are suitable for supplying precursors in atomic layer deposition (ALD) processes where consistent flow rate reproducibility is required.
Features
Compatible with high-temperature environments
Stable Cv value
Adoption of PFA seat
High durability
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KD-S Series
SCV Submersible Valves®
Our KD-S SCV Submersible Valves® series, using our unique technology, provides flow rate reproducibility in high-temperature environments; making them suitable for supplying precursors in atomic layer deposition (ALD) processes.
Features
Compatible with high-temperature environments
Flow rate reproducibility
PFA seat
High durability
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TDF Series
High-Speed High-Cycle Life Valves
The TDF series are high-purity gas-compatible diaphragm valves that combine high-speed opening/closing operation, high durability, heat resistance, and Cv stability required for atomic layer deposition (ALD) and atomic layer etch (ALE) processes.
Features
High-speed opening/closing, and high response stability
Compatible with high-temperature fluids
Stable Cv value
High cycle life
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